3 inch silicon wafer

3 inch silicon wafer: 4H semi-insulating silicon carbide (SiC) wafer is leading the way in next-generation semiconductor technology with its exceptional performance.

As a cutting-edge semiconductor solution, this wafer offers unparalleled physical and chemical stability, and its semi-insulating properties open up new possibilities for the fabrication of power, radio frequency (RF), and optoelectronic devices.

The 3-inch 4H semi-insulating SiC wafer features an advanced tetrahexahedral (4H) crystal structure, ensuring extreme stability and high performance.

Its semi-insulating nature, characterized by high resistance, provides a robust barrier for current isolation, significantly enhancing the efficiency and safety of electronic devices.

3 inch silicon wafer

12 inch silicon wafer
3 inch Diameter 4H Silicon Carbide Substrate Specifications Primary Flat Length22.0 mm ± 2.0 mm
SUBSTRATE PROPERTYUltra GradeProduction GradeResearch GradeDummy Grade
Secondary Flat Length11.0 mm ± 1.5mm
Diameter76.2 mm ±0.38 mm
Wafer EdgeChamfer
Surface Orientationon-axis: {0001} ± 0.2°; off-axis: 4°toward <11-20> ± 0.5°
Micropipe Density≤1 micropipes/ cm2≤5 micropipes/ cm2≤10 micropipes/ cm2≤50 micropipes/ cm2
Primary Flat Orientation<11-20> ± 5.0 ̊
Polytype areas by high-intensity lightNone permitted≤10% area
Secondary Flat Orientation90.0 ̊ CW from Primary ± 5.0 ̊, silicon face up
Resistivity0.015 Ω·cm~0.028 Ω·cm(area 75%)0.015Ω·cm~0.028 Ω·cm
Thickness350.0 μm ± 25.0 μm or 500.0 μm ± 25.0 μm
Bow(absolute value)≤15 μm≤25 μm
TTV≤10 μm≤15 μm
Warp≤35 μm

3 inch silicon wafer

3 inch silicon wafer