8inch wafer 4H N type Production grade 200mm
8inch wafer : In the semiconductor industry, 8-inch silicon carbide (SiC) wafers are emerging as a new driving force due to their large size, high efficiency, and superior performance. However, the production of these large, high-quality SiC wafers presents a series of technical challenges.
8inch SiC Wafers 200mm SiC Substrate Specification
3 inch silicon wafer
Firstly, producing high-quality 200mm (8-inch) 4H-SiC crystal seeds is a daunting task. This requires precise control over growth conditions and material purity to ensure flawless crystal seeds. Additionally, maintaining uniform temperature fields and accurately controlling the nucleation process during crystal growth is crucial.
These factors directly affect the structural integrity and final performance of the crystal. Moreover, managing gas composition and chemical reactions in large crystal growth systems is another major challenge.
To ensure crystal quality, it is essential to effectively control these critical factors. As the crystal size increases, thermal stress issues become more prominent.
This can lead to crystal cracking and defect propagation, impacting the overall quality. To overcome these production challenges and obtain high-quality 8-inch SiC wafers, we have implemented a series of innovative solutions.
By finely tuning the growth environment, we have successfully produced high-quality crystal seeds. Additionally, using advanced temperature control systems, we have maintained stable temperature fields and optimized the nucleation process.
In terms of gas management, we have improved gas flow and reaction kinetics to enhance the efficiency of gas composition management in large crystal growth systems.
We have also implemented strict thermal stress management measures to minimize the risk of cracking and defects during the growth and cooling of large crystals.
The combined effect of these measures has enabled us to produce 8-inch SiC wafers that meet high standards. These wafers not only inherit all the excellent properties of silicon carbide, such as high-temperature resistance and high critical breakdown electric field, but also achieve significant improvements in manufacturing efficiency and product performance.
The larger size means higher production efficiency, allowing more chips to be produced in a single production run, thereby significantly reducing production costs and shortening production cycles.
Additionally, the exceptional performance of 8-inch SiC wafers in packaging technology provides strong support for manufacturing high-performance electronic devices. The larger size offers more flexibility and space in the packaging process, enhancing chip stability and reliability.
Overall, 8-inch SiC wafers are driving the development of the semiconductor industry with their unique advantages.
By overcoming production challenges and implementing a series of innovative solutions, we have successfully introduced these large, high-quality wafers to the market, opening a new chapter for an efficient and reliable future.
Item | Specification |
Size | 8 inch |
Diameter | 200mm ± 0.2 |
Thickness | 500um ± 25 |
Surface Orientation | 4 toward [11-20] ± 0.5° |
Notch Orientation | [1-100] ± 1° |
Notch Depth | 1 ± 0.25mm |
Micropipe | < 1cm² |
Hex Plates | None Permitted |
Resistivity | 0.015 ~ 0.028Ω |
EPD | < 8000cm² |
TED | < 6000cm² |
BPD | < 2000cm² |
TSD | < 1000cm² |
SF | Area < 1% |
TTV | ≤ 15um |
Warp | ≤ 40um |
Bow | ≤ 25um |
Poly Areas | ≤ 5% |
Scratch | < 5 and Cumulative Length < 1 Wafer Diameter |
Chips/Indents | None permit D > 0.5mm Width and Depth |
Cracks | None |
Stain | None |
Wafer Edge | Chamfer |
Surface Finish | Double Side Polish, Si Face CMP |
Packing | Multi-wafer Cassette Or Single Wafer Container |