p doped silicon

p doped silicon

 P-doped silicon is a semiconductor material in which more holes are formed by introducing a trivalent element such as boron into the silicon lattice; these holes act as positive charge carriers, making the material easily conductive.

In integrated circuits, P-type silicon combines with N-type silicon to form PN junctions, which are the basis of electronic devices. Increasing doping concentration decreases its resistivity and is suitable for building P-type semiconductor devices.

p doped silicon

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